p‐type conduction in stacking‐fault‐free <i>m</i> ‐plane GaN

書誌事項

公開日
2007-03-23
権利情報
  • http://onlinelibrary.wiley.com/termsAndConditions#vor
DOI
  • 10.1002/pssr.200701041
公開者
Wiley

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説明

<jats:title>Abstract</jats:title><jats:p>Transport measurements of p‐type <jats:italic>m</jats:italic> ‐plane GaN films grown on low extended‐defect density, free‐standing <jats:italic>m</jats:italic> ‐plane (10<jats:styled-content>$ \bar 1 $<jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="graphic/tex2gif-ueqn-1.gif" xlink:title="equation image" /></jats:styled-content>0) GaN substrates are presented. No significant anisotropy in in‐plane mobility was found for hole concentrations between 2.45 × 10<jats:sup>17</jats:sup> and 8.7 × 10<jats:sup>18</jats:sup> cm<jats:sup>–3</jats:sup>. Since faulted, heteroepitaxial <jats:italic>m</jats:italic> ‐plane films showed significant anisotropy in electron and hole mobility a microstructural feature with anisotropic distribution (basal plane stacking faults) is discussed as a possible source of anisotropic scattering in non‐polar and semi‐polar films. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)</jats:p>

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