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- Y. Estrin
- IWW, TU Clausthal, Agricolastrasse 6, 38678 Clausthal-Zellerfeld, Germany
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- H. S. Kim
- Department of Metallurgical Engineering, Chungnam National University, Taejon, 305-764, Korea
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- M. Kovler
- Tower Semiconductor Limited, P.O. Box 619, Migdal Haemek 23105, Israel
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- G. Berler
- Tower Semiconductor Limited, P.O. Box 619, Migdal Haemek 23105, Israel
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- R. Shaviv
- Tower Semiconductor Limited, P.O. Box 619, Migdal Haemek 23105, Israel
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- E. Rabkin
- Department of Materials Engineering, Technion, Haifa 32000, Israel
抄録
<jats:p>A simple constitutive model was used to predict the efficiency of the aluminum forcefill process. The constitutive description—adopted from the one developed for bulk material—was implemented in a finite-element code and applied to simulate the forcefill process. The results are summarized in the form of a “forcefill map” showing isochrones (constant via filling time lines) on the pressure–temperature plane. Using such a diagram, it is possible to identify the process conditions that warrant complete via filling within a specified time. Comparison of the simulation results with experimental data demonstrates a semiquantitative agreement.</jats:p>
収録刊行物
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- Journal of Applied Physics
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Journal of Applied Physics 93 (9), 5812-5815, 2003-05-01
AIP Publishing