Formation of Single Nanopores with Diameters of 20–50 nm in Silicon Nitride Membranes Using Laser-Assisted Controlled Breakdown

DOI Web Site 被引用文献1件

Cuifeng Ying

Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland
Jared Houghtaling

Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland
Olivia M. Eggenberger

Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland
Anirvan Guha

Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland
Peter Nirmalraj

Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland
Saurabh Awasthi

Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland
Jianguo Tian

Key Laboratory of Weak-Light Nonlinear Photonics, Ministry of Education, School of Physics, Nankai University, Tianjin 300071, China
Michael Mayer

Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland

収録刊行物

ACS Nano

ACS Nano 12 (11), 11458-11470, 2018-10-18

American Chemical Society (ACS)