Validation of intermolecular pair potential model of SiH4: Molecular-dynamics simulation for saturated liquid density and thermal transport properties

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  • Yukinori Sakiyama
    The University of Tokyo Department of Mechanical Engineering, , 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
  • Shu Takagi
    The University of Tokyo Department of Mechanical Engineering, , 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
  • Yoichiro Matsumoto
    The University of Tokyo Department of Mechanical Engineering, , 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

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<jats:p>We demonstrate a validation of the intermolecular pair potential model of SiH4, which is constructed from ab initio molecular-orbital calculations and expressed as the sum of the exponential and the London dispersion terms. The saturated liquid densities of SiH4 are calculated for temperatures from 100to225K by molecular-dynamics (MD) simulation. The average deviation between the experiment and the MD simulation using the present potential model is 3.9%, while the deviations exceed 10% for other well-known potential models such as the five-center Lennard-Jones (LJ) model. Subsequently, the shear viscosity, the thermal conductivity, and the self-diffusion coefficient of liquid SiH4 are calculated by an equilibrium MD simulation with the Green–Kubo formula from 100to225K. The average deviations from experiment are 11.8% and 13.7% for the shear viscosity and the thermal conductivity, respectively. Comparing the present model with an empirical one-center LJ model, it turns out that the rotational energy transfer through the intermolecular potential energy, which comes from the anisotropic potential energy, plays an important role in the thermal conductivity of liquid SiH4. These results indicate that the present intermolecular potential model has an ability to give realistic pictures for liquid SiH4 through molecular simulations.</jats:p>

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