Electrical assessment of copper damascene interconnects down to sub-50 nm feature sizes
Bibliographic Information
- Published
- 2002-10
- Rights Information
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- https://www.elsevier.com/tdm/userlicense/1.0/
- DOI
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- 10.1016/s0167-9317(02)00815-8
- Publisher
- Elsevier BV
Search this article
Journal
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- Microelectronic Engineering
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Microelectronic Engineering 64 (1-4), 409-416, 2002-10
Elsevier BV
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Details 詳細情報について
-
- CRID
- 1363388845158885376
-
- ISSN
- 01679317
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- Data Source
-
- Crossref