Optical beam deflection noncontact atomic force microscope optimized with three-dimensional beam adjustment mechanism

  • Kousuke Yokoyama
    Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan
  • Taketoshi Ochi
    Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan
  • Takayuki Uchihashi
    Joint Research Center for Atom Technology, 1-1-4 Higashi, Tsukuba, Ibaraki 305-0046, Japan
  • Makoto Ashino
    Joint Research Center for Atom Technology, 1-1-4 Higashi, Tsukuba, Ibaraki 305-0046, Japan
  • Yasuhiro Sugawara
    Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan
  • Nobuhito Suehira
    Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan
  • Seizo Morita
    Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan

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<jats:p>We present a design and performance of an optical beam deflection noncontact atomic force microscope (nc–AFM). The optical deflection detection system can be optimized by the three-dimensional beam position adjustment mechanism (the slider which mounts laser diode module, the spherical rotors with mirror and the cylinder which mounts quadrant photodiode) using inertial stepping motors in an ultrahigh vacuum (UHV). The samples and cantilevers are easily exchanged in UHV. The performance of the instrument is demonstrated with the atomically resolved nc-AFM images for various surfaces such as Si(111)7×7, Cu(111), TiO2(110), and thymine/highly oriented pyrolytic graphite.</jats:p>

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