Recent progress in high resolution lithography

DOI Web Site Web Site 被引用文献17件

書誌事項

公開日
2006-01-17
権利情報
  • http://onlinelibrary.wiley.com/termsAndConditions#vor
DOI
  • 10.1002/pat.662
公開者
Wiley

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説明

<jats:title>Abstract</jats:title><jats:p>The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to “unconventional” soft lithography and the self‐assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two‐photon lithography, step‐and‐flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright © 2006 John Wiley & Sons, Ltd.</jats:p>

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