NO and SO2 removal in non-thermal plasma reactor packed with glass beads-TiO2 thin film coated by PCVD process
書誌事項
- 公開日
- 2010-02
- 権利情報
-
- https://www.elsevier.com/tdm/userlicense/1.0/
- https://www.elsevier.com/legal/tdmrep-license
- DOI
-
- 10.1016/j.cej.2009.04.037
- 公開者
- Elsevier BV
この論文をさがす
収録刊行物
-
- Chemical Engineering Journal
-
Chemical Engineering Journal 156 (3), 557-561, 2010-02
Elsevier BV