Fabrication of Ferroelectric Photonic Crystals

  • Soichiro Okamura
    Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST) , 8916-5 Takayama-cho, Ikoma, Nara, 630-0192, Japan
  • Yuuki Mochiduki
    Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST) , 8916-5 Takayama-cho, Ikoma, Nara, 630-0192, Japan
  • Hiroyuki Motohara
    Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST) , 8916-5 Takayama-cho, Ikoma, Nara, 630-0192, Japan
  • Tadashi Shiosaki
    Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST) , 8916-5 Takayama-cho, Ikoma, Nara, 630-0192, Japan

Bibliographic Information

Published
2005-01-01
DOI
  • 10.1080/10584580590899063
Publisher
Informa UK Limited

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ABSTRACT Ferroelectric photonic crystals consisted of a PLZT matrix and 800 nm-pitch air-holes with a diameter of 560 nm were successfully fabricated by the electron-beam-induced patterning process. Hexagonal holes inscribed to the circles with a diameter of 400 nm in a precursor matrix changed to circular holes with a diameter of 560 nm after heat-treatment due to shrinkage of the matrix. The optical properties of CSD-derived PLZT films were also evaluated. The PLZT films showed the refractive index of 2.3 and the Kerr constant of 0.4 × 10− 16 m2/V2. Therefore, it is expected that an applied voltage of 9.7 V to 1 μ m-thick PLZT photonic crystals induces 1%-decrease in refractive index and 40°-swinging of light with a wavelength of 1.55 μ m.

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