The effect of isopropyl alcohol concentration on the etching process of Si-substrates in KOH solutions
書誌事項
- 公開日
- 2011-11
- 権利情報
-
- https://www.elsevier.com/tdm/userlicense/1.0/
- https://www.elsevier.com/legal/tdmrep-license
- https://doi.org/10.15223/policy-017
- https://doi.org/10.15223/policy-037
- https://doi.org/10.15223/policy-012
- https://doi.org/10.15223/policy-029
- https://doi.org/10.15223/policy-004
- DOI
-
- 10.1016/j.sna.2011.09.005
- 公開者
- Elsevier BV
この論文をさがす
収録刊行物
-
- Sensors and Actuators A: Physical
-
Sensors and Actuators A: Physical 171 (2), 436-445, 2011-11
Elsevier BV
