HiSIM2: Advanced MOSFET Model Valid for RF Circuit Simulation

書誌事項

公開日
2006-09
権利情報
  • https://ieeexplore.ieee.org/Xplorehelp/downloads/license-information/IEEE.html
  • https://doi.org/10.15223/policy-029
  • https://doi.org/10.15223/policy-037
DOI
  • 10.1109/ted.2006.880374
公開者
Institute of Electrical and Electronics Engineers (IEEE)

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説明

The compact MOSFET model development trend leads to models based on the channel surface potential, allowing higher accuracy and a reduced number of model parameters. Among these, the Hiroshima University Semiconductor Technology Academic Research Center IGFET Model (HiSIM) solves the surface potentials with an efficient physically correct iteration procedure, thus avoiding additional approximations without any computer run-time penalty. It is further demonstrated that excellent model accuracy for higher-order phenomena, which is a prerequisite for accurate RF circuit simulation, is achieved by HiSIM without any new model parameters in addition to those for describing the current-voltage characteristics

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