Band Alignment Engineering at Cu<sub>2</sub>O/ZnO Heterointerfaces

Sebastian Siol

Technische Universität Darmstadt, Institute of Materials Science, Surface Science Division, Petersenstrasse 32, 64287 Darmstadt, Germany
Jan C. Hellmann

Technische Universität Darmstadt, Institute of Materials Science, Surface Science Division, Petersenstrasse 32, 64287 Darmstadt, Germany
S. David Tilley

Ecole Polytechnique Fédérale de Lausanne (EPFL), Institut des Sciences et Ingénierie Chimiques, Laboratory of Photonics and Interfaces, Station 6, CH-1015 Lausanne, Switzerland
Michael Graetzel

Ecole Polytechnique Fédérale de Lausanne (EPFL), Institut des Sciences et Ingénierie Chimiques, Laboratory of Photonics and Interfaces, Station 6, CH-1015 Lausanne, Switzerland
Jan Morasch

Technische Universität Darmstadt, Institute of Materials Science, Surface Science Division, Petersenstrasse 32, 64287 Darmstadt, Germany
Jonas Deuermeier

i3N/CENIMAT, Universidade NOVA de Lisboa and CEMOP/UNINOVA, Department of Materials Science, Faculty of Science and Technology, Campus de Caparica, 2829-516 Caparica, Portugal
Wolfram Jaegermann

Technische Universität Darmstadt, Institute of Materials Science, Surface Science Division, Petersenstrasse 32, 64287 Darmstadt, Germany
Andreas Klein

Technische Universität Darmstadt, Institute of Materials Science, Surface Science Division, Petersenstrasse 32, 64287 Darmstadt, Germany

書誌事項

DOI

ACS Applied Materials & Interfaces

ACS Applied Materials & Interfaces 8 (33), 21824-21831, 2016-08-15

American Chemical Society (ACS)