Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al
書誌事項
- 公開日
- 1997-10
- 権利情報
-
- https://www.elsevier.com/tdm/userlicense/1.0/
- https://www.elsevier.com/legal/tdmrep-license
- DOI
-
- 10.1016/s0040-6090(97)00212-5
- 公開者
- Elsevier BV
この論文をさがす
収録刊行物
-
- Thin Solid Films
-
Thin Solid Films 307 (1-2), 113-119, 1997-10
Elsevier BV