A pH sensor with a double-gate silicon nanowire field-effect transistor

  • Jae-Hyuk Ahn
    Department of Electrical Engineering 1 , KAIST, Daejeon 305-701, South Korea
  • Jee-Yeon Kim
    Department of Electrical Engineering 1 , KAIST, Daejeon 305-701, South Korea
  • Myeong-Lok Seol
    Department of Electrical Engineering 1 , KAIST, Daejeon 305-701, South Korea
  • David J. Baek
    Department of Electrical Engineering 1 , KAIST, Daejeon 305-701, South Korea
  • Zheng Guo
    Department of Electrical Engineering 1 , KAIST, Daejeon 305-701, South Korea
  • Chang-Hoon Kim
    Department of Electrical Engineering 1 , KAIST, Daejeon 305-701, South Korea
  • Sung-Jin Choi
    Department of Electrical Engineering and Computer Sciences, University of California 2 , Berkeley, California 94720, USA
  • Yang-Kyu Choi
    Department of Electrical Engineering 1 , KAIST, Daejeon 305-701, South Korea

書誌事項

公開日
2013-02-25
DOI
  • 10.1063/1.4793655
公開者
AIP Publishing

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説明

<jats:p>A pH sensor composed of a double-gate silicon nanowire field-effect transistor (DG Si-NW FET) is demonstrated. The proposed DG Si-NW FET allows the independent addressing of the gate voltage and hence improves the sensing capability through an application of asymmetric gate voltage between the two gates. One gate is a driving gate which controls the current flow, and the other is a supporting gate which amplifies the shift of the threshold voltage, which is a sensing metric, and which arises from changes in the pH. The pH signal is also amplified through modulation of the gate oxide thickness.</jats:p>

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