Role of metal–molecule chemistry and interdiffusion on the electrical properties of an organic interface: The Al–F16CuPc case
-
- Chongfei Shen
- Department of Electrical Engineering and Princeton Materials Institute, Princeton University, Princeton, New Jersey 08544
-
- Antoine Kahn
- Department of Electrical Engineering and Princeton Materials Institute, Princeton University, Princeton, New Jersey 08544
-
- Jeffrey Schwartz
- Department of Chemistry, Princeton University, Princeton, New Jersey 08544
書誌事項
- 公開日
- 2001-12-15
- DOI
-
- 10.1063/1.1419263
- 公開者
- AIP Publishing
この論文をさがす
説明
<jats:p>The chemistry and electronic structure of interfaces between Al and copper hexadecafluorophthalocyanine (F16CuPc) are studied via x-ray photoemission spectroscopy, ultraviolet photoemission spectroscopy (UPS), and current–voltage measurements. Electron injection barriers measured by UPS are reported. Analysis of the Al–F16CuPc reaction shows the formation of a phase of three-dimensional (F16CuPc)3Al species. The reacted region is extended at the Al-on-F16CuPc interface and narrow at the F16CuPc-on-Al interface. A series of metal/F16CuPc/metal structures is fabricated to study the impact of the interface chemistry and deposition sequence on device performances. It is found that (F16CuPc)3Al forms a low conductivity region, which has considerable bearing on the electron current. The interface fabrication sequence, which defines the thickness of the reacted region, therefore has a profound impact on device performance.</jats:p>
収録刊行物
-
- Journal of Applied Physics
-
Journal of Applied Physics 90 (12), 6236-6242, 2001-12-15
AIP Publishing
