Plasma Anodization of Metals and Semiconductors

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  • John F. O’Hanlon
    International Business Machines Corporation, T. J. Watson Research Center, Yorktown Heights, New York 10598

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<jats:p>This paper presents a review and analysis of the literature on plasma anodization in the negative glow of the dc discharge. New data by the author on anodic film contamination by reactive cathode sputtering are presented. It is shown that certain anomalous data in the literature may be explained as being caused by cathode sputtering and sputter etching of the anodic film. Some applications of anodization are discussed.</jats:p>

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