Impact of O[sub 3] Concentration on Ultrathin HfO[sub 2] Films Deposited on HF-Cleaned Silicon Using Atomic Layer Deposition with Hf[N(CH[sub 3])(C[sub 2]H[sub 5])][sub 4]
書誌事項
- 公開日
- 2006
- DOI
-
- 10.1149/1.2217134
- 公開者
- The Electrochemical Society
この論文をさがす
収録刊行物
-
- Electrochemical and Solid-State Letters
-
Electrochemical and Solid-State Letters 9 (9), G285-, 2006
The Electrochemical Society
