Experimental study on intermediate and gradient index dielectric thin films by a novel reactive sputtering method

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  • Q. Tang
    Kobe Design University, 8-1-1 Gakuennishi-cho, Nishi-ku, Kobe 651-21, Japan
  • S. Ogura
    Kobe Design University, 8-1-1 Gakuennishi-cho, Nishi-ku, Kobe 651-21, Japan
  • M. Yamasaki
    Shincron Co. Ltd. 3-2-6 Minamiohi-cho, Shinagawa-ku, Tokyo 140, Japan
  • K. Kikuchi
    Shincron Co. Ltd. 3-2-6 Minamiohi-cho, Shinagawa-ku, Tokyo 140, Japan

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<jats:p>Here we report a novel reactive sputtering method, called two-stage high rate reactive sputtering method, its principles, and apparatus setup, and the results of optical properties of thin films obtained by this method. Then two typical antireflection coatings, one with an intermediate and homogeneous layer and the other with a gradient layer, have been successfully produced by this method. Their spectrum performances and microstructures are also presented.</jats:p>

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