IR studies of the impact of Ge doping on the successive conversion of VOn defects in Czochralski-Si containing carbon

  • C. A. Londos
    University of Athens 1 Solid State Physics Section, , Panepistimiopolis Zografos, Athens 157 84, Greece
  • A. Andrianakis
    University of Athens 1 Solid State Physics Section, , Panepistimiopolis Zografos, Athens 157 84, Greece
  • E. N. Sgourou
    University of Athens 1 Solid State Physics Section, , Panepistimiopolis Zografos, Athens 157 84, Greece
  • V. V. Emtsev
    Ioffe Physicotechnical Institute of the Russian Academy of Sciences 2 , Politeknicheskaya ul. 26, 194021 St. Petersburg, Russia
  • H. Ohyama
    Kumamoto National College of Technology 3 , 26592, Nishigoshi, Kumamoto 861-1102, Japan

抄録

<jats:p>We report infrared absorption studies of oxygen-related defects in electron-irradiated Ge-doped Czochralski-Si. Our investigation was mainly focused on the reaction channel leading to the formation of VOn (1≤n≤6) defects. The VOn defects form mainly upon annealing, as a result of the successive aggregation of oxygen atoms in the initial VO defect produced by the irradiation: (VO+Oi→VO2+Oi→VO3+Oi→VO4,…). It was found that the ratio of the conversion of VOn to VOn+1 defects is sensitive to the Ge content of the material. In particular, the ratio of the conversion of the VO to the VO2 defects was found to decrease with the increase in Ge concentration of the samples, although the opposite trend was observed for the VO3 to VO4 conversion. However, the VO2 to VO3 conversion changes only slightly with Ge content, being practically unaffected for Ge concentrations up to 2×1020 cm−3. In the case of VO2 formation, the phenomenon was attributed to the elastic strains induced in the lattice due to the Ge presence which affects the balance between the reactions VO+Oi→VO2, VO+SiI→Oi, mainly involved in the decay of the VO and the growth of the VO2 defects. In the case of VO4 formation, the phenomenon was discussed by taking into account the enhancement of the diffusivity of the Oi atoms in the Ge-doped Si, which could lead to an enhancement of the rate of the reaction VO3+Oi→VO4. For the VO3 formation this effect is practically negligible due to the fact that at the temperatures of VO2 to VO3 conversion oxygen diffusivity is quite small. The exhibited behavior in the conversion of the VOn to VOn+1 defects (n=1,2,3) was similar in Ge-doped samples with low carbon content ([Cs]&lt;2×1016 cm−3) and in Ge-doped samples with high carbon content ([Cs]≥1×1017 cm−3). The impact of C as well as its role in the conversion efficiency of VO to VO2 was studied by comparing the spectra in low carbon and high carbon Ge free Si material. Furthermore, a pair of bands at (1037,1051 cm−1) was attributed to the VO5 defect. The origin of another pair of bands (967,1005 cm−1) was discussed and tentatively correlated with a VOnCs structure. The role of Ge and C in the formation of the latter two pairs of bands was discussed.</jats:p>

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