Photolithography and plasma processing of polymeric lab on chip for wetting and fouling control and cell patterning

詳細情報 詳細情報について

• CRID

  1364233270588729600

• DOI

  10.1016/j.mee.2014.04.020

• ISSN

  01679317

• Web Site

  https://api.elsevier.com/content/article/PII:S0167931714001610?httpAccept=text/xml

  https://api.elsevier.com/content/article/PII:S0167931714001610?httpAccept=text/plain

• データソース種別

  • Crossref