ミニカラムキレート樹脂分離／誘導結合プラズマ発光分析法による高純度シリカ，窒化ケイ素及び炭化ケイ素中の微量金属の定量

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タイトル別名
  • Determination of trace metals in high purity silica, silicon nitride and silicon carbide by ICP-AES after separation with mini-column chelating resin.
  • ミニカラム キレート ジュシ ブンリ ユウドウ ケツゴウ プラズマ ハッコウ

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The retention behavior of 38 elements on mini-column iminodiacetate type chelating resin (0.5 cm3) was investigated by using ICP-AES or AAS. Divalent ions, their oxocompounds and some trivalent ions could be recovered from this mini-column after the adsorption. For the simultaneous recovery of these elements, the adsorption and elution were carried out at pH 4 and 9 M nitric acid, respectively. On the other hands, monovalent ions and their oxocompounds could not be retained on this chelating resin. Twenty one elements (Al, Ba, Ca, Ni, Pb, U, Th etc.) in high purity silica, silicon nitride and silicon carbide were determined by ICP-AES after separation with this mini-column chelating resin. The lower detection limit of each element in high purity silica and silicon nitrde showed nearly same values, but in the case of silicon carbide, these values were higher due to the complexity of its analytical procedure.

収録刊行物

  • 分析化学

    分析化学 39 (6), T83-T87, 1990

    公益社団法人 日本分析化学会

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