薄膜のけい光Ｘ線分析へのモンテカルロ法の応用

DOI NDLデジタルコレクション Web Site Web Site

書誌事項

タイトル別名
  • Application of Monte Calro method for the fluorescence X-ray analysis of thin films
  • ハクマク ノ ケイコウ Xセン ブンセキ エ ノ モンテカルロホウ ノ オウヨ

この論文をさがす

抄録

In a fluorescence X-ray analysis of Ag-Cu thin film alloys on Al, Ni, and Ta metal substrates, an excitation effect due to the scattered X-ray from the substrate was observed. The Cu Kα intensity is strongly enhanced with the Al substrate when compared with the Ta one, while the Ag Kα intensity is not so much affected by the kind of the substrate. The substrate effect was evaluated by simulating the X-ray scattering process within the thin film specimen and the substrate by using the Monte Cairo technique. The theoretical correction including the matrix effect within the thin film was then applied to the simultaneous determination of its composition and thickness. The analytical results by the proposed method for the Ag-Cu thin film alloys (Ag:Cu=72:28) formed on the Al substrate with the thickness of 170 nm and 320 nm were Ag-Cu=68:32 with the thickness of 150nm and Ag:Cu=70:30 with the thickness of 310 nm, respectively. By applying the theoretical correction, the proposed fluorescent X-ray spectrometric method allows one to use a bulk specimen as a reference as well as the thin film and is effective for a nondestructive analysis of thin film specimens on substrates.

収録刊行物

  • 分析化学

    分析化学 29 (12), 843-849, 1980

    公益社団法人 日本分析化学会

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ