Fabrication of nanowire by conventional MEMS process and application for sensing bio-species

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  • AKIYAMA Sho
    東京大学大学院工学系研究科
  • GINET Patrick
    東京大学生産技術研究所　マイクロナノメカトロニクス国際研究センター
  • CHENG Yi-Tung
    東京大学大学院工学系研究科
  • TAKAMA Nobuyuki
    東京大学生産技術研究所　マイクロナノメカトロニクス国際研究センター
  • KIM Beomjoon
    東京大学生産技術研究所　マイクロナノメカトロニクス国際研究センター

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Other Title
  • MEMS技術を用いたナノワイヤの製作およびバイオ物質センシングへの応用
  • MEMS ギジュツ オ モチイタ ナノワイヤ ノ セイサク オヨビ バイオ ブッシツ センシング エ ノ オウヨウ

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Abstract

Nanowires have attracted much attention for many years because they are most attractive from the point of view of high sensitivity and surface-modifying for various sensors. Recently, silicon nanowires (SiNWs) are widely applied for biosensors. But the method of SiNW fabrication is hard to say suited to mass production because conventional top-down fabrication method needs nano-lithography processes. From these back grounds, we fabricated silicon nanowires from Silicon-on-Insulator (SOI) wafer with conventional only micro-fabrication processes and we showed that the resulting devices exhibited FET behavior after ion implantation allowing us to detect pH and a protein binding. But a few attempts were made so far to control their temperature although this parameter has been shown to be crucial when dealing with biochemical reactions. We also present the results of temperature control of silicon nanowires by using fluorescence thermometry. The resistive heating on nanowires was carried out with applying voltage potential of 6~12V in air condition, and the temperature at the central line along SiNWs increasing from 30 degrees to 35~70 degree was observed.

Journal

  • SEISAN KENKYU

    SEISAN KENKYU 62 (3), 249-254, 2010

    Institute of Industrial Science The University of Tokyo

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