書誌事項
- タイトル別名
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- Properties of low vollage discharge in vapor and Cr film deposited by its discharge.
- ジョウハツ リュウシ ノ テイ デンアツ ホウデン トクセイ ト クロム マク
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説明
Cr vapor evaporated by an EB-gun in high vacuum. It was found from the measurement results of discharge characteristics that the anode voltage (VA) dependence of discharge current (Id) is represented as Id∝ (VA)n with inflection points (VA=26, 47 V) at the VA to the 3rd and 4th ionization potentials of Cr. It can be assumed that the character of the charged particles changes the inflection points. These studies have been developed for the properties of Cr films deposited on various VA on 7059 glass and Si substrates. The relations to VA of the crystal orientation, electrical properties and optical reflection of the visible region of Cr films have been discussed.
収録刊行物
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- 真空
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真空 34 (2), 101-106, 1991
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001204063487616
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- NII論文ID
- 130000868838
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 3700950
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可