Preparation and Estimation of Thin Films From Organosilicon-based Polymers by a Laser Ablation Method.
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- FUJINO Takahiro
- Research Institute for Advanced Science and Technology, Osaka Prefecture University
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- MITSUMOTO Yoshimasa
- Research Institute for Advanced Science and Technology, Osaka Prefecture University
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- OKA Kunio
- Research Institute for Advanced Science and Technology, Osaka Prefecture University
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- DOHMARU Takaaki
- Research Institute for Advanced Science and Technology, Osaka Prefecture University
Bibliographic Information
- Other Title
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- レーザーアブレーションによる有機ケイ素高分子薄膜の作製と評価
- レーザーアブレーション ニ ヨル ユウキ ケイ コウブンシ ハクマク ノ サクセイ ト ヒョウカ
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Abstract
We prepared thin films from poly (methylphenilsilane) (PMPS) and poly (dimethylsilane) (PDMS) by eximer-laser ablation and characterized them as light-emitting material for electroluminescence. The deposited films were characterized by UV, PL (photoluminescence) and FT-IR spectra, and the changes of the targets were examined by PL spectra. The FT-IR spectra of the deposited PDMS films showed that irradiation of PDMS targets at high pulse frequency (100 Hz) gave films that contained very small amount of Si-H groups, meaning that films of the similar chemical composition as the original PDMS were successfully produced. The deposited films that exhibit PL emission around 360 nm at room temperature were obtained from both of the polysilanes. The I-V curve for a LED based on a PDMS films is reported, while its EL emission has not observed yet.
Journal
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- Shinku
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Shinku 43 (3), 373-376, 2000
The Vacuum Society of Japan
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Details 詳細情報について
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- CRID
- 1390001204063571840
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- NII Article ID
- 10004561863
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 5361663
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed