書誌事項
- タイトル別名
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- Deposition of ZnO Thin Films on z-cut LiNbO3 Substrates Using Sputtering Technique.
- zカット LiNbO3 キバン ジョウ エ ノ ZnO スパッタ ハクマク ノ ケイセイ
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We have reported formation of ZnO thin films deposited on z-cut LiNbO3 substrates using RF-sputtering technique. The substrate temperatures during deposition were changed from 300 to 703 K in various oxygen-argon atmospheres. ZnO (002) peak intensity depending on gas flow rate of oxygen to argon, substrate temperature and anneal temperature were observed. The film showed the crystalline growth highly oriented at [002] direction, when the film on z-cut LiNbO3 substrate was deposited at 603 K in Ar (80%) +O2 (20%) gas or annealed at 890 K in argon atmosphere.
収録刊行物
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- 真空
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真空 43 (3), 193-196, 2000
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001204063640320
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- NII論文ID
- 10004561503
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 5360760
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可