書誌事項
- タイトル別名
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- Orientation Control of Potassium Niobate Thin Film Prepared by Sputtering.
- スパッタホウ ニ ヨル ニオブサン カリウム ハクマク ノ ハイコウセイ セイギョ
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抄録
Potassium niobate thin films were prepared on amorphous (SrO-SiO2) layer/Si wafer by means of RF magnetron sputtering using a (KNbO3+ K2CO3) mixed powder target. Amorphous (SrO-SiO2) layers under the potassium niobate thin films were prepared by means of RF magnetron sputtering using a (SrCO3 + SiO2) mixed powder target. Crystallization and orientation of the potassium niobate thin films depended on (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions under the potassium niobate thin films. The orientation of potassium niobate thin films could be controlled by a favorable choice of (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions, and produced highly [110] oriented perovskite type potassium niobate thin films.
収録刊行物
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- 真空
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真空 42 (5), 581-584, 1999
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001204065812480
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- NII論文ID
- 10004568012
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 4761237
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
