スクリーン印刷したインキマスクを用いたＩＴＯマスクスパッタリングによるＩＴＯのパターニング

DOI

書誌事項

タイトル別名
  • The Patterning of ITO Film by Mask Sputtering of ITO with the Screen Printed Ink Mask.

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説明

The pattern of indium tin oxide (ITO) layer suitable to transparent electrode of color filter for TFT·LCD was successfully formed by mask sputtering of ITO at relatively low temperature (95°C) followed by post-baking at 230°C. The temporary mask was printed by a screen printing with the ink based on poly-[vinyl alcohol] mixed with 3wt% SiO2 powder, which can be easily washed off by aqueous alkaline solution even if after ITO sputtering. Thus formed ITO pattern shows a good fine pattern with sharp edge, and moreover has low electrical resistivity less than 25ohm/Sq and high optical transmittance more than 90% at 550nm.

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詳細情報 詳細情報について

  • CRID
    1390001204089546112
  • NII論文ID
    130004186795
  • DOI
    10.11413/nig1987.34.92
  • ISSN
    18824935
    09143319
  • 本文言語コード
    ja
  • データソース種別
    • JaLC
    • CiNii Articles
  • 抄録ライセンスフラグ
    使用不可

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