書誌事項
- タイトル別名
-
- Formation of a Positive Photoresist Thin Film by Spin Coating. Influence of the Viscosity.
- Formation of a Positive Photoresist Thin Film by Spin Coating
- Formation of a Positive Photoresist Thi
- Influence of the Viscosity
この論文をさがす
抄録
Experimental film formation with a positive photoresist solution having various viscosities on wafers by spin coating was investigated. The baked films formed with the lower viscosities are thinner thicknesses at any spinning time due to the higher rates of outflow in the initial stage of the spinning and the higher rates of evaporation in the intermediate stages. Their minimum thickness deviations, which exist in the intermediate stages of the spinning, decrease and change to earlier stages. Those phenomena are more distinct at lower spin speeds.
収録刊行物
-
- 日本印刷学会誌
-
日本印刷学会誌 34 (3), 155-163, 1997
社団法人 日本印刷学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001204090042496
-
- NII論文ID
- 130004069213
- 10002020796
-
- NII書誌ID
- AN10161648
-
- ISSN
- 18824935
- 09143319
-
- NDL書誌ID
- 4276044
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可
