書誌事項
- タイトル別名
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- Properties of Electroless Solder Plated Films.
- ムデンカイ ハンダ メッキ ノ ヒマク トクセイ
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抄録
Electroless solder plating by the displacement reaction has been investigated. The addition of free borofluoride and hydroxylamine both improved the stability and extended the life of the plating bath The plating bath reaction was initiated 10s after immersion of the copper substrate into the bath Deposition morphology after 1min of reaction was similar to the final equilibrium stage of the deposit. Wettability was decreased due to diffusion of copper at film thickness of around 0.5μm, but (film thickness of 4μm or more) wettability was excellent with no decrease observed
収録刊行物
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- 表面技術
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表面技術 44 (1), 60-64, 1993
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390001204114436480
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- NII論文ID
- 130001072694
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- NII書誌ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 3812466
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可