Fundamental Analyses on Electrochemical Deposition Processes. Mechanisms of Electrochemical Plating under Magnetic and Gravitational Fields.
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- AOGAKI Ryoichi
- Japan Science & Technology Corp.
Bibliographic Information
- Other Title
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- めっき析出過程の基礎解析 磁場・重力場の影響を考慮した析出機構
- ジバ ジュウリョクバ ノ エイキョウ オ コウリョ シタ セキシュツ キコウ
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Journal
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- Journal of The Surface Finishing Society of Japan
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Journal of The Surface Finishing Society of Japan 50 (5), 421-424, 1999
The Surface Finishing Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001204114574080
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- NII Article ID
- 10002112465
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- NII Book ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL BIB ID
- 4725664
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
