書誌事項
- タイトル別名
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- Highly Dispersive Adsorption of Ag Nanoparticle Catalyst for Electroless Copper Plating
- ムデンカイ ドウメッキヨウ Ag ナノ リュウシ ショクバイ ノ コウブンサン キュウチャク ト ショクバイ カッセイ
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説明
A sensitizer-activator process or a colloidal Pd/Sn process has been widely employed as the catalyst for electroless Cu plating on non-conductive substrates. The authors investigated Ag nanoparticle suspensions as a Pd-free catalyst for the electroless Cu plating. Ag nanoparticle suspensions were prepared by reducing the Ag+ ions in aqueous solutions using Sn2+ ions. The adsorption properties of the Ag nanoparticles on the glass substrates were evaluated by X-ray photoelectron spectra, atomic force microscopy examinations, and UV-vis adsorption spectra, comparing some cationic polymer electrolytes used for conditioning the substrates. It was confirmed that a large quantity of Ag nanoparticles were adsorbed homogenously onto the substrate conditioned with poly (diallyldimethylammonium) chloride. The catalytic activities for the electroless Cu plating were evaluated by the oxidation rate of HCHO. The Ag-nanoparticle adsorbed substrates showed a catalytic activity as high as that of the conventional colloidal Pd/Sn catalyst. High catalytic activity is attributed to highly dispersive adsorption of the Ag nanoparticles on a large surface area.
収録刊行物
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- 表面技術
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表面技術 58 (12), 841-845, 2007
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390001204116864768
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- NII論文ID
- 10019979600
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DC%2BD1cXjslaktw%3D%3D
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 9293271
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
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- 抄録ライセンスフラグ
- 使用不可