Effect of Pulse Electrolysis on the Hardness and Texture of Nickel Deposit Obtained from Additive Free Watt Bath

DOI 25 References

Bibliographic Information

Other Title
  • 添加剤フリーワット浴から得られたニッケルめっきの硬度と組織に及ぼすパルス電解の影響

Search this article

Description

Pulse plating was used to prepare nickel films from a Watts bath with no additives. The influences of the current pulse electrolysis parameters of duty ratio=0.03-0.33, Ton=0.1-5 ms, and Iav=2-10Adm-2, on the hardness, texture, and crystal orientation were investigated. Those characteristics were studied respectively using a nano-indenter hardness tester, scanning electron microscopy, and XRD. Results showed the importance of Iav for obtaining high-hardness films. The highest value of hardness was 4.5 GPa at Ton=1 ms, duty ratio=0.1, and Iav=10 Adm-2. Hardness is related closely to the texture. A Hall-Petch relation was observed between the hardness and grain size. The preferred orientation changed to the(311)→(220)→(200)plane with increase of the duty ratio when the pulse parameters were Ton=1 ms and Iav=5Adm-2.

Journal

References(25)*help

See more

Keywords

Details 詳細情報について

  • CRID
    1390001204117278720
  • NII Article ID
    10031075348
  • NII Book ID
    AN1005202X
  • DOI
    10.4139/sfj.63.591
  • COI
    1:CAS:528:DC%2BC3sXos1Sr
  • ISSN
    18843409
    09151869
  • Text Lang
    ja
  • Data Source
    • JaLC
    • Crossref
    • CiNii Articles
  • Abstract License Flag
    Disallowed

Report a problem

Back to top