Fabrication of Metal Micropattern on Self-Assembled Monolayer by Site-Selective Electroless Plating and Pattern Transfer onto Polymer Sheet

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  • 自己組織化単分子膜を利用した選択的無電解めっきによる金属パターンの作製とポリマー上への転写
  • ジコ ソシキカタンブンシ マク オ リヨウ シタ センタクテキ ムデンカイメッキ ニ ヨル キンゾク パターン ノ サクセイ ト ポリマー ジョウ エ ノ テンシャ

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We prepared a self-assembled monolayer (SAM) from p-aminophenyltrimethoxysilane (APhS : NH2C6H10Si(OCH3)3) on Si substrate through chemical vapor deposition. The microstructured APhS-SAM/SiOx template onto Si substrate was fabricated by conventional vacuum ultraviolet lithography. Pd was selectively immobilized on regions of APhS-SAM as a catalyst for electroless Cu plating. The pH of the Pd solution was optimized by measuring the amount of deposited Pd obtained by X-ray photoelectron spectroscopy. At the pH values of 5 and 6, the amount of deposited Pd on the APhS-SAM increased. A Pd micropattern was prepared on the microstructured APhS-SAM from the solution. Cu was site-selectively deposited onto the microstructured Pd regions. The obtained Cu micropattern was transferred onto a Nafion® sheet by nanoimprint lithography. The shape of Cu micropattern on the sheets was observed to be the same as it is on the silicon substrate.<br>

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