Improvement in Adhesion of Cu/glass Stacks using ZnO Thin Films Deposited by Chemical Solution Methods and Its Formation Conditions
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- WATANABE Mitsuhiro
- Graduate Faculty of Interdisciplinary Research, University of Yamanashi
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- KOIKE Koumi
- Faculty of Engineering, University of Yamanashi
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- KONDOH Eiichi
- Graduate Faculty of Interdisciplinary Research, University of Yamanashi
Bibliographic Information
- Other Title
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- 塗布法によって堆積したZnO薄膜を用いたCu/ガラス構造の密着性向上ならびにその形成条件の検討
- トフホウ ニ ヨッテ タイセキ シタ ZnO ハクマク オ モチイタ Cu/ガラス コウゾウ ノ ミッチャク セイコウ ジョウ ナラビニ ソノ ケイセイ ジョウケン ノ ケントウ
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Abstract
After zinc oxide (ZnO) thin films were deposited using chemical solution methods such as sol-gel method and metal organic decomposition, the deposited ZnO thin films were used as a precursor promoting adhesion in Cu/glass stack systems. Transparent ZnO thin films were deposited on a borosilicate glass substrate using chemical solution methods. X-ray diffraction and X-ray photoelectron spectroscopy analyses revealed that the deposited ZnO thin films have no specified orientation and much less carbon contamination. The obtained ZnO thin films comprised two characteristic layers: a porous structure formed at the glass substrate side and a dense layer formed at the surface side. The adhesion of Cu/glass stacks formed by the ZnO thin films increased markedly when the ZnO/glass stacks were annealed at 600 ℃. Furthermore, the adhesion increased with increasing ZnO removal time, reaching a maximum value at a certain removal time, but decreasing thereafter. These results indicate that the deposited ZnO thin films are effective for the improvement of Cu/glass stack adhesion. Results show that a Zn-doped layer formed at the glass surface plays an important role in the improvement of Cu/glass stack adhesion.
Journal
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- Journal of The Surface Finishing Society of Japan
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Journal of The Surface Finishing Society of Japan 66 (11), 534-539, 2015
The Surface Finishing Society of Japan
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Details 詳細情報について
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- CRID
- 1390001204118235392
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- NII Article ID
- 130005267941
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- NII Book ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL BIB ID
- 026860830
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed