Influence of Growth Conditions on Amorphous Germanium Films Prepared by Vacuum-Evaporation
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- Tatsumi Yukichi
- Natural Science, Faculty of Education, Sinshu University
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- Honda Hirokazu
- Natural Science, Faculty of Education, Sinshu University
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- Ikegami Kaori
- Natural Science, Faculty of Education, Sinshu University
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- Naito Shinichi
- Natural Science, Faculty of Education, Sinshu University
書誌事項
- タイトル別名
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- Influence of Growth Conditions on Amorp
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Amorphous germanium films under various growth conditions are investigated by X-ray diffraction and the method of densimetry. The density decreases continuously with decreasing deposition rate, and when the deposition rate ranges from 1.7×10−3 to 5.1 nm/s, the density changes from 2.77 to 4.63 g/cm3. Furthermore, the densities are 2.91 g/cm3 at a pressure of 0.12 Pa and ∼4.3 g/cm3 at ∼10−4 Pa under the same deposition rate of 0.38 nm/s. It can be concluded that the most possible origin for the low density is the existing residual gas.
収録刊行物
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- Journal of the Physical Society of Japan
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Journal of the Physical Society of Japan 56 (8), 2977-2981, 1987
一般社団法人 日本物理学会
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詳細情報 詳細情報について
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- CRID
- 1390001204186045952
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- NII論文ID
- 110001960580
- 210000093511
- 130003739952
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- NII書誌ID
- AA00704814
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- BIBCODE
- 1987JPSJ...56.2977T
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- COI
- 1:CAS:528:DyaL2sXmsVKqtbo%3D
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- ISSN
- 13474073
- 00319015
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- NDL書誌ID
- 3142618
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可