Magnetocrystalline and Uniaxial Anisotropy in Electrodeposited Single Crystal Films of Cobalt and Nickel

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Torque magnetometry was used to determine the uniaxial anisotropy, Ku, observed in addition to the normal magnetocrystalline anisotropy (K1 and K2) in single crystal f.c.c. Co and Ni films electrodeposited on to (110) Cu single crystal substrates. The easy direction of Ku was found to be the [001] in the film plane and its magnitude at 1000Å was of the order of K1 for each material with maximum values of −7.7×105 erg cm−3 for Co and −3.4×105 erg cm−3 for Ni occurring at about 150Å at which thickness K1 and K2 also attained maxima.<BR>An empirical relation describing the dependence upon thickness t in angströms is given of the form,<BR>−Ku(erg cm−3)=K0exp(−tn)+K[1−exp(−t⁄100)]<BR>The two terms represent the contributions from strain energy originating in the initial layers and in hydrogen included into the deposit respectively. Measurements of K1, K2 and Ku are given for composite layer films which yield unexpected results.

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