Curie Temperature of Nickel Films Evaporated in Ultra-High Vacuum

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  • Morita Nobuyoshi
    Department of Physics, College of Science and Engineering, Aoyama Gakuin University
  • Taniyama Noriko
    Department of Physics, College of Science and Engineering, Aoyama Gakuin University

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The Curie temperature of nickel films deposited in ultra-high vacuum was determined by measuring Hall voltage, electrical resistance and magnetoresistance of films as functions of temperature. A fall of the Curie temperature was observed as thickness decreases below 300Å. The Curie temperature of films is independent of substrate temperature during deposition. The effects of impurities on the Curie temperature are also discussed.

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