Formation of Compositionally Graded Ni–P Deposits Containing SiC Particles by Jet Electroplating
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- Takeuchi Hiromitsu
- Toyota Technological Institute
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- Tsunekawa Yoshiki
- Toyota Technological Institute
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- Okumiya Masahiro
- Toyota Technological Institute
書誌事項
- タイトル別名
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- Formation of Compositionally Graded Ni–P Deposits Containing SiC Particles by Jet Electroplating
- Formation of Compositionally Graded Ni
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抄録
This paper presents a new electroplating process that uses an electrolyte jet containing SiC particles for the formation of electrodeposited Ni–P matrix composite coatings. The electrolyte jet remarkably increases the limiting current density in electroplating, so that the deposition rate will be approximately 10 times faster than that of conventional electroplating without an electrolyte jet. The fast deposition rate is caused by the thin diffusion layer adjacent to the cathode surface due to the electrolyte jet. The jet velocity determines the volume fraction of SiC particles in the range of 0∼30 vol% without changing the particle concentration in electrolytes. The phosphorus content in deposits is also controlled by the jet velocity without changing the phosphinic acid concentration in electrolytes. Hence, the jet electroplating realizes SiC particle/Ni–P deposits with a compositional gradient regarding the phosphorus content and the particle volume fraction with an extremely fast deposition rate.
収録刊行物
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- Materials Transactions, JIM
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Materials Transactions, JIM 38 (1), 43-48, 1997
社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001204246624640
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- NII論文ID
- 130003556844
- 10002451512
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- NII書誌ID
- AA10699969
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- COI
- 1:CAS:528:DyaK2sXhslejsbw%3D
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- ISSN
- 2432471X
- 09161821
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- NDL書誌ID
- 4209525
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可