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- Tanaka Kazuhide
- Department of Materials Science and Engineering, Nagoya Institute of Technology
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- Nagai Kosuke
- Department of Materials Science and Engineering, Nagoya Institute of Technology
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X-ray diffraction and Auger-electron spectroscopy depth profiling experiments clearly show that an interlayer reaction in a Ni/V bilayer forming Ni3V and Ni2V takes place at a temperature around 823 K when it is annealed in vacuum. However, this reaction temperature is reduced down to around 773 K when it is annealed in 0.5 MPa H2. A similar effect has also been observed for a Ni/Nb bilayer previously. These hydrogen-enhanced reactions in the two systems are interpreted to be due to formation of abundant vacancy-hydrogen complexes in the V and Nb layers, which efficiently assist the interdiffusion of the constituent atoms across the interfaces in the two bilayers.
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 43 (11), 2692-2695, 2002
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001204248193152
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- NII論文ID
- 10012327781
- 30018850567
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- NII書誌ID
- AA1151294X
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- COI
- 1:CAS:528:DC%2BD3sXjtFaq
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 6366966
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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