Formation of Anatase on Commercially Pure Ti by Two-Step Thermal Oxidation Using N<sub>2</sub>–CO Gas
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- Umetsu Nobuyuki
- Department of Materials Processing, Tohoku University
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- Sado Shota
- Department of Materials Processing, Tohoku University
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- Ueda Kyosuke
- Department of Materials Processing, Tohoku University
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- Tajima Kazuki
- Materials Research Institute for Sustainable Development, National Institute of Advanced Industrial Science and Technology (AIST)
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- Narushima Takayuki
- Department of Materials Processing, Tohoku University
Bibliographic Information
- Other Title
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- Formation of Anatase on Commercially Pure Ti by Two-Step Thermal Oxidation Using N2–CO Gas
- Formation of Anatase on Commercially Pure Ti by Two-Step Thermal Oxidation Using N<sub>2</sub>–CO Gas
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Abstract
The phase of a TiO2 layer formed on commercially pure Ti by two-step thermal oxidation using N2–CO gas was investigated. The oxidation process comprised two steps: treatment in an N2–(0.1, 1 and 5)%CO atmosphere and treatment in air. A Ti(C,N,O) phase was formed after the first-step treatment conducted at 873–1123 K. In the second step, the oxidation of this phase at 573–773 K resulted in the formation of an anatase phase, while its oxidation at 873 K resulted in the formation of a single rutile phase. An increase in the CO partial pressure in the first step lowered the temperature for anatase phase formation. Further, in the second step, a single-phase anatase layer was formed at temperatures of 623 and 673 K.
Journal
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 54 (8), 1302-1307, 2013
The Japan Institute of Metals and Materials
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Details 詳細情報について
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- CRID
- 1390001204249896704
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- NII Article ID
- 120006846726
- 10031189478
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- NII Book ID
- AA1151294X
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- COI
- 1:CAS:528:DC%2BC3sXhs1SqtLfL
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- ISSN
- 13475320
- 13459678
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- HANDLE
- 10097/00127760
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- NDL BIB ID
- 024716139
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- Text Lang
- en
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- Data Source
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- JaLC
- IRDB
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed