Cyclic Voltammetric and Chronoamperometric Deposition of CdS
-
- Kim Yongkuk
- Department of Chemistry, Daejin University
-
- Jung Jaegoo
- Department of Chemistry, Daejin University
-
- Kim Seunghun
- Department of Chemistry, Daejin University
-
- Chae Won-Seok
- Department of Chemistry, Daejin University
Search this article
Abstract
CdS was electrochemically deposited on ITO using cyclic voltammetry (CV) and chronoamperometry (CA) in aqueous solution. To fabricate the CdS thin films, a potential ranging from −0.3 to −1.2 V was applied for CV and a constant potential of −1.1 V was applied for CA (Ag|AgCl). The deposited CdS thin films were characterized in detail using XRD, AFM and SEM. UV/Vis-transmittance was used to determine the band-gap energy (Eg) of the films. The dopant densities and flat band-potentials (Efb) were determined using Mott-Schottky plots. The CdS film obtained by CV deposition was observed to be rougher and sparser than that obtained by CA deposition. This was attributed to the alternating reduction–oxidation, corresponding to deposition–dissolution of CdS. The carrier density of the CdS film deposited by CV was measured to be as much as 17%.
Journal
-
- MATERIALS TRANSACTIONS
-
MATERIALS TRANSACTIONS 54 (8), 1467-1472, 2013
The Japan Institute of Metals and Materials
- Tweet
Details 詳細情報について
-
- CRID
- 1390001204249902208
-
- NII Article ID
- 10031189506
-
- NII Book ID
- AA1151294X
-
- COI
- 1:CAS:528:DC%2BC3sXhs1SqtbzJ
-
- ISSN
- 13475320
- 13459678
-
- NDL BIB ID
- 024716646
-
- Text Lang
- en
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed