Design and Fabrication of Wire Grid Polarizer by Nanoimprinting and Glancing Angle Deposition Processes

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Abstract

<p>We report a simple and cost-effective fabrication method for a wire grid polarizer. The wire grid polarizer was fabricated by incorporating UV nanoimprinting and glancing angle deposition processes. A silicon pattern with a 40 nm line width, 100 nm pitch, and 100 nm height was fabricated by electron beam (E-beam) lithography and reactive ion etching processes. The UV nanoimprinting process was performed on a glass substrate and aluminum nanowires, with a height of 70 nm, were subsequently generated with a glancing angle deposition process. P-polarization transmittance above 55% and an extinction ratio of 31.1～6.1 were measured in the visible wavelength range.</p>

Journal

  • MATERIALS TRANSACTIONS

    MATERIALS TRANSACTIONS 58 (3), 494-498, 2017

    The Japan Institute of Metals and Materials

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