Effect of Roll-Bonding and Subsequent Annealing on Microstructure Evolution of Accumulative Roll Bonded Pure Copper
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- Miyajima Yoji
- Department of Materials Science and Engineering, Tokyo Institute of Technology
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- Uchiyama Midori
- Department of Materials Science and Engineering, Tokyo Institute of Technology
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- Adachi Hiroki
- Department of Materials and Synchrotron Radiation Engineering, Graduate School of Engineering, University of Hyogo
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- Fujii Toshiyuki
- Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology
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- Onaka Susumu
- Department of Materials Science and Engineering, Tokyo Institute of Technology
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- Kato Masaharu
- Department of Materials Science and Engineering, Tokyo Institute of Technology
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説明
<p>The microstructure and texture evolution of an accumulative roll bonding (ARB) processed 4N-Cu with and without lubrication were compared in addition to the mechanical properties, in order to understand the effect of additional shear strain caused by the friction between the rolls and a sheet. Furthermore, subsequent annealing at 423 K, 448 K and 473 K was applied for 4N-Cu ARB processed with and without lubrication, and, softening was observed for all temperatures. The texture change due to the ARB process and subsequent annealing were discussed using {111} pole figures and ODF maps. As a result, a 45° rotated Cube texture around ND was formed by additional shear strain, whereas the typical fcc rolling texture was formed by ARB with lubrication. At higher ARB cycles of 4N-Cu, discontinuous recrystallization occurs due to its medium stacking fault energy. Cube orientation appeared in annealed-ARB processed 4N-Cu with lubrication, whereas no specific texture appeared in annealed-ARB processed 4N-Cu without lubrication</p>
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 57 (9), 1411-1417, 2016
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001204254733440
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- NII論文ID
- 130005289899
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- NII書誌ID
- AA1151294X
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 027571042
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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