Organic Monolayer Determination on Semiconductor Substrates

DOI Web Site Web Site 被引用文献1件 参考文献2件

この論文をさがす

抄録

Organic materials are routinely coated on semiconductor substrates for various photolithographic processes. The cleanliness of a substrate after being coated with a bottom anti-reflective coating (BARC), photoresist, or both was studied using contact angle measurement, atomic force microscopy (AFM), and ellipsometry. The relationship between the various methods was correlated. It was found that all organic materials leave a monolayer of residue. These materials have higher affinity to silicon than for silicon oxide substrates.

収録刊行物

被引用文献 (1)*注記

もっと見る

参考文献 (2)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ