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- Fukuhara Makoto
- School of Science and Engineering, Waseda University
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- Ono Hiroshi
- School of Science and Engineering, Waseda University
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- Hirasawa Tamano
- Toyo Gosei Co.,Ltd
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- Otaguchi Makoto
- Toyo Gosei Co.,Ltd
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- Sakai Nobuji
- Toyo Gosei Co.,Ltd
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- Mizuno Jun
- School of Science and Engineering, Waseda University
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- Shoji Shuichi
- School of Science and Engineering, Waseda University
この論文をさがす
抄録
Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (4), 549-554, 2007
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390001204323818368
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- NII論文ID
- 130004464583
- 40015602527
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1WmsLg%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 8919319
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可