Control of Morphology Orientation in Lithographically Patternable Diblock Copolymers
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- Bosworth Joan K.
- Department of Materials Science and Engineering, Bard Hall, Cornell University,
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- Andre Xavier
- Department of Materials Science and Engineering, Bard Hall, Cornell University,
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- Schwartz Evan L.
- Department of Materials Science and Engineering, Bard Hall, Cornell University,
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- Ruiz Ricardo
- IBM T. J. Watson Research Center
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- Black Charles T.
- IBM T. J. Watson Research Center
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- Ober Christopher K.
- Department of Materials Science and Engineering, Bard Hall, Cornell University,
この論文をさがす
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (4), 519-522, 2007
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詳細情報 詳細情報について
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- CRID
- 1390001204323822464
-
- NII論文ID
- 130004464577
- 40015602521
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1WmsL4%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 8919198
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles