Novel Ionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

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  • Wang Mingxing
    Polymer Nanotechnology Laboratory at Center for Optoelectronic and Optical Communications & Department of Chemistry, University of North Carolina
  • Yueh Wang
    Intel Corp.
  • Gonsalves Kenneth E.
    Polymer Nanotechnology Laboratory at Center for Optoelectronic and Optical Communications & Department of Chemistry, University of North Carolina

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Three novel polymeric anionic and one cationic photoacid generators(PAGs), as well as corresponding PAG bound polymers, were prepared in moderate to good yield and characterized. As for the lithographic properties, the anionic PAG bound polymers showed improved resolution and photospeed than the cationic PAG bound polymer. Especially, the fluorine PAG bound polymer resist HS-EA-PAG(c) showed high photospeed and improved resolution than other PAG bound polymer. Therefore, it should be potential for these new PAG and PAG bounder polymers to be applied to EUV lithography.

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