Synthesis and Optical Properties of EB Induced Refractive Index Lithography materials Based on Aliphatic Polyimides
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- Yamashita Takashi
- Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science
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- Ogawara Mutuki
- Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science
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- Koshikawa Hiroshi
- Conducting Polymer Materials Group, Quantum Beam Science Directorate, Japan Atomic Energy Agency
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- Maekawa Yasunari
- Conducting Polymer Materials Group, Quantum Beam Science Directorate, Japan Atomic Energy Agency
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抄録
Electron beam reaction induced refractive index change of several polyimides, which are one of the most thermo stable polymers. Introducing aliphatic amine into polyimide makes the polymer transparent and colorless in the visible wavelength region due to restriction of charge transfer, as well as increase in the sensitivity to electron beam induced reaction. One of the aliphatic polyimide, PI(HPMDA/mix-DCHM), prepared form cyclohexane tetracarboxylic anhydride and diaminodicyclohexylamine, change the refractive index as large as 10-3 for both TE and TM modes. Chemical reaction during the EB irradiation was also determined as electron beam induced aromatization occurred.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (5), 739-742, 2007
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詳細情報 詳細情報について
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- CRID
- 1390001204323863936
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- NII論文ID
- 130004464608
- 40015602552
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1Wmt78%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 8919124
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可