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- Kawai Yoshio
- New Functional Materials Research Center, Shin-Etsu Chemical Co. Ltd.
抄録
The Photopolymer Science and Technology Award No.42100, the Best Paper Award 2004, was presented to Christopher K. Ober (Cornell University), Katsuji Douki (JSR Micro, Inc.), Young C. Bae (Rohm and Haas Electronic Materials), Junyan Dai (Cornell University) and Will Conley (International SEMATECH) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 16(4), 573-580 (2003), entitled "Strategies for High Transparency Acrylate Resists for 157nm Lithography", ibid., 15(4), 603-612 (2002) entitled "Strategiess for High Resolution Photoresists", and ibid., 14(4), 613-620 (2001),entitled "Rejuvenation of 248 nm Resist Backbones for 157 nm Lithography".
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 17 (1), 7-9, 2004
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390001204323975552
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- NII論文ID
- 130004832979
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- ISSN
- 13496336
- 09149244
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可